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Thin Film Deposition
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History of the museum
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Our thin film deposition laboratory offers custom design and manufacturing services to researchers and companies. Our experts can design the coating that best suits your needs and optimize the manufacturing process. Our technologies offer great flexibility in terms of composition, thickness, density and number of layers to produce many components such as mirrors, optical filters and many more. Contact us for an assessment of the feasibility of your project.
Technologies
LEYBOLD SYRUS PRO 710
- Oxide: Ti3O5, Ta2O5, HfO2, Al2O3
- Silica: SiO2
- Ion plasma-assisted electron beam evaporation (APS) with in-situ optical thickness measurement (400-2500 nm); multilayer deposition (max 100).
INTLVAC NANOCHROME
- Targets: Ta, Al, V, W, Nb, Si
- Reactive gases: O2, N2, C2H6
- AC double magnetron sputtering of metal sources followed by oxide/nitride deposition via ion source; deposition of multilayers (max. 100) with optimized density.
OTHER SYSTEMS
- - Intlvac Nanochrome: Thermal evaporation and electron beam system dedicated to thick layers and infrared materials.
- - Electron beam evaporation system for deposition (SiO2, ZnS, MgF2, YbF3, Al2O3, etc.).
- - Joule effect thermal evaporator for Cr, Au, Al, Ag, Cu deposition dedicated to the manufacture of metal mirrors and plasmonic layers.
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